Low energy ion assisted film growth /

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This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low en...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: González-Elipe, A. R.
Otros Autores: Yubero, F., Sanz, J. M. (José María)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: London : Singapore : Imperial College Press ; World Scientific [distributor], ©2003.
Temas:
Thin films > Design and construction.
Thin films > Effect of radiation on.
Ion bombardment.
Couches minces > Effets du rayonnement sur.
Bombardement ionique.
TECHNOLOGY & ENGINEERING > Electronics > Solid State.
TECHNOLOGY & ENGINEERING > Electronics > Semiconductors.
Ion bombardment
Thin films > Design and construction
Thin films > Effect of radiation on
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Cover
  • Contents
  • Foreword
  • CHAPTER 1: BASIC CONCEPTS ON THE INTERACTION OF LOW ENERGY ION BEAMS WITH SOLID TARGETS
  • 1.1. Introduction
  • 1.2. Interatomic interaction
  • 1.3. Basic concepts in classical dynamics of binary elastic collisions
  • 1.4. Range of energetic ions in solids
  • 1.5. Spatial distribution of deposited energy
  • 1.6. Damage induced by ion bombardment
  • 1.7. Sputtering
  • 1.8. Experimental parameters in IAD thin film growth
  • References
  • CHAPTER 2: ION ASSISTED METHODS OF PREPARATION OF THIN FILMS
  • 2.1. Assistance of film growth with independent ion sources
  • 2.2. Ion assisted deposition of thin films without independent ion sources
  • 2.3. Plasma immersion ion implantation
  • 2.4. Broad beam ion sources
  • References
  • CHAPTER 3: EFFECTS INDUCED BY THE ION ASSISTANCE OF FILM GROWTH
  • 3.1. Ion beam effects during film growth
  • 3.2. Nucleation and growth of thin films under ion bombardment &

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