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Proceedings of the International Workshop on Physics and Technology of Thin Films : IWTF 2003, Tehran, Iran, 22 February-6 March 2003 /

Thin films science and technology plays an important role in the high-tech industries. Thin film technology has been developed primarily for the need of the integrated circuit industry. The demand for development of smaller and smaller devices with higher speed especially in new generation of integr...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor Corporativo: International Workshop on Physics and Technology of Thin Films Tehran, Iran
Otros Autores: Moshfegh, Alireza Zaker
Formato: Electrónico Congresos, conferencias eBook
Idioma:Inglés
Publicado: River Edge, NJ : World Scientific Pub., ©2004.
Temas:
Acceso en línea:Texto completo

MARC

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111 2 |a International Workshop on Physics and Technology of Thin Films  |d (2003 :  |c Tehran, Iran) 
245 1 0 |a Proceedings of the International Workshop on Physics and Technology of Thin Films :  |b IWTF 2003, Tehran, Iran, 22 February-6 March 2003 /  |c editors, A.Z. Moshfegh [and others]. 
246 1 8 |a Physics and technology of thin films 
246 3 0 |a IWTF 2003 
260 |a River Edge, NJ :  |b World Scientific Pub.,  |c ©2004. 
300 |a 1 online resource (xv, 532 pages) :  |b illustrations 
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504 |a Includes bibliographical references and index. 
588 0 |a Print version record. 
505 0 |a Vacuum technology: principles and applications (Invited) / A.Z. Moshfegh -- PVD growth method: physics and technology (Invited) / A.Z. Moshfegh -- Introduction to semiconductor epitaxy (Invited) / H. von Känel -- Semiconductor superlattices (Invited) / H. von Känel -- Oxide thin film growth on silicon carbide surfaces (Invited) / P.G. Soukiassian -- Al-W amorphous thin films (Invited) / N. Radić [and others] -- Heat and mass transfer during ZnSe CVD deposition process / V.G. Minkina -- Thin films analysis using photoelectron spectroscopy (Invited) / S.K. Kulkarni -- Passivation investigations of GaAs (100) surface / R. Purandare [and others] -- Correlation between microscopic and macroscopic properties of yttria-stabilized zirconia thin films / M. Hartmanova [and others] -- Reliability and failure of electronic materials and devices (Invited) / M. Ohring -- Diffusion in multilayers / S. Luby, E. Majkova and A. Luches -- Dynamics of interacting adatoms on complex surfaces / Z. Chvoj -- Copper surface segregation during V[symbol]O[symbol] thin film deposition / M.M. Ahadian [and others] -- The Preparation and surface studies of Fe/Pt thin films / G. Varghese -- 1D-nanostructures on silicon carbide thin films (Invited) / P.G. Soukiassian -- Giant magnetoresistance in electrodesposited nanogranular thin films (Invited) / S.C. Kashyap -- Self-assembled quantum dots: structural and optical properties, and device applications / M. Henini -- Preparation and characterization of ultrathin films and film coatings for microelectronics / Y.A. Pogoryelov -- Nanocrystalline films in the Ag-Ni system / I.K. Bdikin [and others] -- Fragmentation of positively charged metal clusters in stabilized jellium model with self-compression / M. Payami -- Organic films for optoelectronic applications (Invited) / X. Liu, T. Michely and M. Wuttig -- Development of highly reactive photo-catalytic TiO[symbol] films (Invited) / S.H. Mohamed [and others] -- Multilayer thin-film optical filters: design, fabrication, and Applications (Invited) / S.H. Keshmiri and M.M. Mirsalehi -- Thin films for optical recording / A. Kikineshi -- Diffusion of atomic hydrogen and passivation of structural defects in silicon and in transparent-conducting thin films (Invited) / S.H. Keshmiri -- The effect of particle size on optical properties of CdS films formed by photochemical technique / S.M. Mahdavi [and others]. 
505 8 |a Enhancement in physical properties of ZnO transparent conducting coating by Al incorporation / B.N. Pawar [and others] -- Optical energy gap of magnetically confined arc discharge D.C. sputtered hydrogenated amorphous silicon / M.C. Abdulrida, H.A. Hamed and B.A. Hassan -- Photocatalytic study of TiO[symbol] thin films deposited by DC reactive magnetron sputtering and spray pyrolysis methods / A.I. Martinez, D. Acosta and A. Lóopez -- Novel transparent and highly conductive ZnO-based coatings / B.M. Ataev [and others] -- Low-temperature CVD growth of ZnO films stimulated by RF-discharge plasma / B.M. Ataev [and others] -- Physics and applications of YB[symbol][symbol]Cu[symbol]O[symbol]/La[symbol]Sr[symbol]MnO[sy mbol] heterostructures (Invited) / J.G. Lin -- Domain Structure of YB[symbol][symbol]Cu[symbol]O[symbol] films on NdGaO[symbol] substrates / I.K. Bdikin [and others] -- Raman active apical oxygen modes in Cu[symbol][symbol]Tl[symbol]Ba[symbol]Ca[symbol]Cu[symbol]O[symb ol][symbol] superconductor thin films / N.A. Khan and H. Ihara -- Generation and amplification of electromagnetic radiation by superconducting films -- a superconductor maser / A.N. Lykov -- Fabrication of YBCO and BSCCO thin films / H. Salamati, P. Kameli and M. Akhavan -- Some aspects in thin film magnetism (Invited) / M. Farlee -- Microscopic mechanisms of magnetooptical activity in epitaxial garnet films (Invited) / A.I. Popov -- Design, fabrication and applications of multilayer thin-film SQUID sensors (Invited) / D. Rassi and Y.E. Zhuravlev -- Deposition and characterization of Fe/Si multilayers / S. Kharrazi [and others] -- Surface nonlinear Magneto-optical effect in antiferromagnetics / A.K. Zvezdin [and others] -- Fabrication and characterization of the Co/Cu/Co/NiO/Si(100) magnetic multilayer / A.Z Moshfegh [and others] -- Optimisation of thin film multi-layers by micromagnetic simulations for MR applications / P. Görnert, D.V. Berkov and N.L. Gorn. 
520 |a Thin films science and technology plays an important role in the high-tech industries. Thin film technology has been developed primarily for the need of the integrated circuit industry. The demand for development of smaller and smaller devices with higher speed especially in new generation of integrated circuits requires advanced materials and new processing techniques suitable for future giga scale integration (GSI) technology. In this regard, physics and technology of thin films can play an important role to acheive this goal. The production of thin films for device purposes has been developed over the past 40 years. Thin films as a two dimensional system are of great importance to many real-world problems. Their material costs are very small as compared to the corresponding bulk material and they perform the same function when it comes to surface processes. Thus, knowledge and determination of the nature, functions and new properties of thin films can be used for the development of new technologies for future applications. Thin film technology is based on three foundations: fabrication, characterization and applications. Some of the important applications of thin films are microelectronics, communication, optical electronics, catalysis, coating of all kinds, and energy generation and conservation strategies. This book emphasizes the importance of thin films and their properties for the new technologies. It presents basic principles, processes techniques and applications of thin films. As thin films physics and technology is a multidisciplinary field, the book will be useful to a wide variety of readers (especially young researcher) in physics, electronic engineering, material science and metallurgy. 
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650 0 |a Thin film devices  |v Congresses. 
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650 7 |a Thin films  |2 fast 
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700 1 |a Moshfegh, Alireza Zaker. 
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