Plasma deposition of amorphous silicon-based materials /

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Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Bruno, Giovanni, Capezzuto, Pio, Madan, A. (Arun)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Boston : Academic Press, ©1995.
Colección:Plasma--materials interactions.
Temas:
Amorphous semiconductors > Design and construction.
Silicon alloys.
Plasma-enhanced chemical vapor deposition.
Silicium > Alliages.
Dépôt chimique en phase vapeur activé par plasma.
TECHNOLOGY & ENGINEERING > Electronics > Solid State.
TECHNOLOGY & ENGINEERING > Electronics > Semiconductors.
Semiconductors
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices.

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