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Plasma deposition of amorphous silicon-based materials /
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | , , |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Boston :
Academic Press,
©1995.
|
| Colección: | Plasma--materials interactions.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 037 | |a 81576:81576 |b Elsevier Science & Technology |n http://www.sciencedirect.com | ||
| 050 | 4 | |a TK7871.99.A45 |b P55 1995eb | |
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| 245 | 0 | 0 | |a Plasma deposition of amorphous silicon-based materials / |c edited by Giovanni Bruno, Pio Capezzuto, Arun Madan. |
| 260 | |a Boston : |b Academic Press, |c ©1995. | ||
| 300 | |a 1 online resource (xi, 324 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Plasma--materials interactions | |
| 504 | |a Includes bibliographical references and index. | ||
| 588 | 0 | |a Print version record. | |
| 505 | 0 | |a Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices. | |
| 520 | |a Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. | ||
| 590 | |a eBooks on EBSCOhost |b EBSCO eBook Subscription Academic Collection - Worldwide | ||
| 650 | 0 | |a Amorphous semiconductors |x Design and construction. | |
| 650 | 0 | |a Silicon alloys. | |
| 650 | 0 | |a Plasma-enhanced chemical vapor deposition. | |
| 650 | 6 | |a Silicium |x Alliages. | |
| 650 | 6 | |a Dépôt chimique en phase vapeur activé par plasma. | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Solid State. |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Semiconductors. |2 bisacsh | |
| 650 | 7 | |a Amorphous semiconductors |x Design and construction. |2 fast |0 (OCoLC)fst00807850 | |
| 650 | 7 | |a Plasma-enhanced chemical vapor deposition. |2 fast |0 (OCoLC)fst01066369 | |
| 650 | 7 | |a Silicon alloys. |2 fast |0 (OCoLC)fst01118655 | |
| 653 | 0 | |a Semiconductors | |
| 700 | 1 | |a Bruno, Giovanni. | |
| 700 | 1 | |a Capezzuto, Pio. | |
| 700 | 1 | |a Madan, A. |q (Arun) | |
| 776 | 0 | 8 | |i Print version: |t Plasma deposition of amorphous silicon-based materials. |d Boston : Academic Press, ©1995 |z 012137940X |z 9780121379407 |w (DLC) 95012433 |w (OCoLC)32311752 |
| 830 | 0 | |a Plasma--materials interactions. | |
| 856 | 4 | 0 | |u https://ebsco.uam.elogim.com/login.aspx?direct=true&scope=site&db=nlebk&AN=207143 |z Texto completo |
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