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EBSCO_ocm62326580 |
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OCoLC |
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051122s1995 nyua ob 001 0 eng d |
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|a Tani, Tadaaki.
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1 |
0 |
|a Photographic sensitivity :
|b theory and mechanisms /
|c Tadaaki Tani.
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260 |
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|a New York :
|b Oxford University Press,
|c 1995.
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|a 1 online resource (viii, 254 pages) :
|b illustrations.
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|a online resource
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|a Oxford series in optical and imaging sciences ;
|v 8
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|a Includes bibliographical references and index.
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|a Print version record.
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|a 1 Silver Halide Photographic Materials; 2 Structure and Preparation of Silver Halide Grains; 3 Physical Properties of Silver Halides; 4 Mechanism of Latent Imaging Formation; 5 Spectral Sensitization; 6 Chemical Sensitization and Stabilization; 7 Development-Amplification of Latent Image; 8 Future Prospect of Silver Halide Photography; Index.
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|a Notwithstanding the current excitement surrounding cutting-edge digital imaging techniques, photographic film still provides the highest resolution and most beautiful images of any medium available. For the first time in nearly 20 years, Photographic Sensitivity: Theory and Mechanisms offers a comprehensive, systematic description of the subject, stressing in particular the characteristics of silver halide photography. Topics range from how to prepare silver halide grains and latent image formation to spectral and chemical sensitization to the future of silver halide photography. Based on the.
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|b EBSCO eBook Subscription Academic Collection - Worldwide
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|a Silver halide crystals.
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|a Photography
|x Films.
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|a PHOTOGRAPHY
|x Techniques
|x General.
|2 bisacsh
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|a Photography.
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|0 (OCoLC)fst01061714
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|a Silver halide crystals.
|2 fast
|0 (OCoLC)fst01118911
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|a Dünne Schicht
|2 gnd
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|a Fotografie
|2 gnd
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|a Silberhalogenide
|2 gnd
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|a Sensibilisierung (Photographie)
|2 swd
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|a Photography
|a Processing
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|a Motion pictures.
|2 fast
|0 (OCoLC)fst01726252
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776 |
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8 |
|i Print version:
|a Tani, Tadaaki.
|t Photographic sensitivity.
|d New York : Oxford University Press, 1995
|z 0195072405
|w (DLC) 95006100
|w (OCoLC)32050333
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|
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|a Oxford series in optical and imaging sciences ;
|v 8.
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856 |
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|u https://ebsco.uam.elogim.com/login.aspx?direct=true&scope=site&db=nlebk&AN=143776
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