Plasma processing and processing science /

Mostrar otras versiones (1)
Detalles Bibliográficos
Clasificación:Libro Electrónico
Autores Corporativos: National Research Council (U.S.). Panel on Plasma Processing, National Research Council (U.S.). Naval Studies Board, National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications
Otros Autores: Chen, Francis F., 1929-
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Washington, D.C. : National Academy Press, 1995.
Colección:NRL strategic series.
Temas:
Plasma engineering.
Semiconductors > Etching.
Plasma etching.
Technique des plasmas.
Semi-conducteurs > Attaque chimique.
Gravure par plasma.
TECHNOLOGY & ENGINEERING > Mechanical.
Plasma engineering
Plasma etching
Semiconductors > Etching
Acceso en línea:Texto completo
Descripción
Notas:Committee chair: Francis F. Chen.
This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.
Descripción Física:1 online resource (x, 35 pages)
ISBN:0309575168
9780309575164

Ejemplares similares