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|a Venables, John,
|d 1936-
|
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|a Introduction to surface and thin film processes /
|c John A. Venables.
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260 |
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|a Cambridge, UK ;
|a New York :
|b Cambridge University Press,
|c 2000.
|
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|a 1 online resource (xvi, 372 pages) :
|b illustrations
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|a Includes bibliographical references (pages 331-361) and index.
|
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0 |
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|t Introduction to surface processes --
|t Surfaces in a vacuum : ultra-high vacuum techniques and processes --
|t Electron-based techniques for examining surface and thin film processes --
|t Surface processes in adsorption --
|t Surface processes in epitaxial growth --
|t Electronic structure and emission processes at metallic surfaces --
|t Semiconductor surfacess and interfaces --
|t Surface processes in thin film devices --
|t Postscript -- where do we go from here?
|
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|a Print version record.
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|a This book covers the experimental and theoretical background to surface and thin film processes, presenting extensive leads into practical and research literature, as well as to resources on the World Wide Web (see http://venables.asu.edu/book). Each chapter contains detailed problems. Suitable as a graduate textbook and sourcebook.
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|a Thin films.
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|a Surface chemistry.
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6 |
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|a Chimie des surfaces.
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|a SCIENCE
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|x General.
|2 bisacsh
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|a SCIENCE
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|x General.
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|a SCIENCE
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|a Surface chemistry.
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|0 (OCoLC)fst01139210
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|a Thin films.
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|i Print version:
|a Venables, John, 1936-
|t Introduction to surface and thin film processes.
|d Cambridge, UK ; New York : Cambridge University Press, 2000
|z 0521624606
|w (DLC) 99087614
|w (OCoLC)43114310
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