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Conductive Atomic Force Microscope.
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Newark :
John Wiley & Sons, Incorporated,
2017.
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| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Title Page; Copyright; Table of Contents; Oxide Films and Conduction AFM; References; List of Contributors; Chapter 1: History and Status of the CAFM; 1.1 The Atomic Force Microscope; 1.2 The Conductive Atomic Force Microscope; 1.3 History and Status of the CAFM; 1.4 Editor's Choice: On the Use of CAFM to Study Nanogenerators Based on Nanowires; 1.5 Conclusions; References; Chapter 2: Fabrication and Reliability of Conductive AFM Probes; 2.1 Introduction; 2.2 Manufacturing of Conductive AFM Probes; 2.3 How to Choose Your C-AFM Tip.
- 2.4 Tip Wear and Sample Damage: Applicable Forces and Currents in C-AFM2.5 Conclusions; References; Chapter 3: Fundamentals of CAFM Operation Modes; 3.1 Introduction; 3.2 Tip-Sample Interaction: Contact Area, Effective Emission Area, and Conduction Mechanisms; 3.3 Work Function Difference and Offset Voltage; 3.4 Operation Modes; 3.5 Case Studies; 3.6 Conclusion and Future Perspectives; Acknowledgment; References; Chapter 4: Investigation of High-k Dielectric Stacks by C-AFM: Advantages, Limitations, and Possible Applications; 4.1 Introduction.
- 4.2 Comparison Between Macroscopic I-V Measurements and C-AFM4.3 Influence of Displacement Currents on the Sensitivity of C-AFM Measurements; 4.4 Applications of C-AFM; 4.5 Conclusion; References; Chapter 5: Characterization of Grain Boundaries in Polycrystalline HfO2 Dielectrics; 5.1 Introduction; 5.2 Experimental Details and Sample Specifications; 5.3 Formation of Grain Boundaries and Its Local Electrical Properties in HfO2 Dielectric; 5.4 RVS and CVS Stressing of HfO2/SiOx Dielectric Stack; 5.5 Uniform Stressing with Successive Scanning in CAFM Mode; 5.6 Conclusions; References.
- Chapter 6: CAFM Studies on Individual GeSi Quantum Dots and Quantum Rings6.1 Introduction; 6.2 Conductive Properties of Individual GeSi QDs and QRs; 6.3 Modulating the Conductive Properties of GeSi QDs; 6.4 Simultaneous Measurements of Composition and Current Distributions of GeSi QRs; 6.5 Conclusions; References; Chapter 7: Conductive Atomic Force Microscopy of Two-Dimensional Electron Systems: From AlGaN/GaN Heterostructures to Graphene and MoS2; 7.1 Introduction; 7.2 Nanoscale Electrical Characterization of AlGaN/GaN Heterostructures; 7.3 CAFM Characterization of Graphene and MoS2.
- 7.4 ConclusionsAcknowledgments; References; Chapter 8: Nanoscale Three-Dimensional Characterization with Scalpel SPM; 8.1 Introduction; 8.2 SPM Metrology with Depth Information; 8.3 Scalpel SPM: A Tip-Based Slice-and-View Methodology; 8.4 Applications; 8.5 Conclusions and Outlook; References; Chapter 9: Conductive Atomic Force Microscopy for Nanolithography Based on Local Anodic Oxidation; 9.1 Introduction to AFM Nanolithography; 9.2 Local Anodic Oxidation; 9.3 Kinetics of LAO; 9.4 Measurement of Electrical Current During LAO; 9.5 Conclusions; Acknowledgments; References.