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Particles on surfaces 8 : Detection, adhesion and removal.
This work documents the proceedings of the 8th International Symposium on Particles on Surfaces - Detection, Adhesion and Removal, held in Providence, Rhode Island, from June 24-26, 2002. Topics include nature and characterization of small particles, and particle deposition during immersion rinsing.
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Leiden :
BRILL,
2003.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 100 | 1 | |a Mittal, K. L. | |
| 245 | 1 | 0 | |a Particles on surfaces 8 : |b Detection, adhesion and removal. |
| 260 | |a Leiden : |b BRILL, |c 2003. | ||
| 300 | |a 1 online resource (361 pages) | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 588 | 0 | |a Print version record. | |
| 505 | 0 | |a Preface; Part 1: Particle Analysis / Characterization and General Cleaning-Related Topics; The nature and characterization of small particles; Surface and micro-analytical methods for particle identification; The haze of a wafer: A new approach to monitor nano-sized particles; Particle transport and adhesion in an ultra-clean ion-beam sputter deposition process; Particle deposition from a carry-over layer during immersion rinsing; The use of surfactants to reduce particulate contamination on surfaces; The use of rectangular jets for surface decontamination. | |
| 505 | 8 | |a Ice-air blast cleaning: Case studiesDevelopment of a technique for glass cleaning in the course of demanufacturing of electronic products; Part 2: Particle Adhesion and Removal; Mechanics of nanoparticle adhesion -- A continuum approach; A new thermodynamic theory of adhesion of particles on surfaces; Particle adhesion on nanoscale rough surfaces; Advanced wet cleaning of sub-micrometer sized particles; Modified SC-1 solutions for silicon wafer cleaning; Investigation of ozonated DI water in semiconductor wafer cleaning; Possible post-CMP cleaning processes for STI ceria slurries. | |
| 505 | 8 | |a The ideal ultrasonic parameters for delicate parts cleaningEffects of megasonics coupled with SC-1 process parameters on particle removal on 300-mm silicon wafers; Influences of various parameters on microparticles removal during laser surface cleaning; Particle removal with pulsed-laser induced plasma over an extended area of a silicon wafer; Particle removal by collisions with energetic clusters. | |
| 520 | |a This work documents the proceedings of the 8th International Symposium on Particles on Surfaces - Detection, Adhesion and Removal, held in Providence, Rhode Island, from June 24-26, 2002. Topics include nature and characterization of small particles, and particle deposition during immersion rinsing. | ||
| 590 | |a ProQuest Ebook Central |b Ebook Central Academic Complete | ||
| 650 | 0 | |a Particles |v Congresses. | |
| 650 | 0 | |a Surfaces (Technology) |v Congresses. | |
| 650 | 6 | |a Particules (Matière) |v Congrès. | |
| 650 | 6 | |a Surfaces (Technologie) |v Congrès. | |
| 650 | 7 | |a Particles |2 fast | |
| 650 | 7 | |a Surfaces (Technology) |2 fast | |
| 655 | 7 | |a Conference papers and proceedings |2 fast | |
| 700 | 1 | |a Mittal, K. L. | |
| 758 | |i has work: |a Particles on surfaces 8 (Text) |1 https://id.oclc.org/worldcat/entity/E39PCG9Q8TPBtC6kcywXjYh9ym |4 https://id.oclc.org/worldcat/ontology/hasWork | ||
| 776 | 0 | 8 | |i Print version: |a Mittal, K.L. |t Particles on surfaces 8 : Detection, adhesion and removal. |d Leiden : BRILL, ©2003 |z 9789067643924 |
| 856 | 4 | 0 | |u https://ebookcentral.uam.elogim.com/lib/uam-ebooks/detail.action?docID=253651 |z Texto completo |
| 936 | |a BATCHLOAD | ||
| 994 | |a 92 |b IZTAP | ||