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OCoLC |
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20240329122006.0 |
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m o d |
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151010s1996 dcu o 000 0 eng d |
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|a EBLCP
|b eng
|e pn
|c EBLCP
|d OCLCQ
|d MERUC
|d OCLCQ
|d XFH
|d OCLCQ
|d OCLCO
|d ZCU
|d AGLDB
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|d OCLCQ
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|d AU@
|d OCLCQ
|d UKAHL
|d OCLCQ
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|d OCLCQ
|d OCLCO
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|a 994354921
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|a 9780309573535
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|a 030957353X
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|a 0309055911
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|a 9780309055918
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1 |
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|a DEBBG
|b BV044107388
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|a (OCoLC)923265516
|z (OCoLC)994354921
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|a TK7871.85.D374 1996eb
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| 082 |
0 |
4 |
|a 537.6/221
|q OCoLC
|2 21/eng/20231120
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| 049 |
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|a UAMI
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| 100 |
1 |
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|a Staff, National Research Council.
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| 245 |
1 |
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|a Database Needs for Modeling and Simulation of Plasma Processing.
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| 260 |
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|a Washington :
|b National Academies Press,
|c 1996.
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| 300 |
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|a 1 online resource (74 pages)
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| 336 |
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|a text
|b txt
|2 rdacontent
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| 337 |
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|a computer
|b c
|2 rdamedia
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| 338 |
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|a online resource
|b cr
|2 rdacarrier
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| 490 |
0 |
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|a The compass series Database needs for modeling and simulation of plasma processing
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| 588 |
0 |
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|a Print version record.
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| 505 |
0 |
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|a Database Needs for Modeling and Simulation of Plasma Processing -- Copyright -- Preface -- Contents -- Executive Summary -- FINDINGS -- CONCLUSIONS -- RECOMMENDATIONS -- REFERENCES -- 1 Industrial Perspectives -- INTRODUCTION -- PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING -- PLASMA EQUIPMENT SUPPLIER PERSPECTIVES -- CHIP MANUFACTURER PERSPECTIVES -- RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE -- FINDINGS -- CONCLUSIONS -- REFERENCES -- 2 Tool Scale and Feature Scale Models -- INTRODUCTION -- TOOL SCALE MODELS
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| 505 |
8 |
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|a Capabilities Needed for Tool Scale ModelsBarriers to Using Tool Scale Models -- FEATURE SCALE MODELS -- GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS -- FINDINGS -- CONCLUSIONS -- REFERENCES -- 3 Radiative Processes and Diagnostics -- INTRODUCTION -- TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES -- Information Resources -- Roles of the Database In Motivating Diagnostic Experiments -- SURFACE REACTION DATABASE AND DIAGNOSTICS -- Information Resources -- New Diagnostic Techniques -- FINDINGS
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| 504 |
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|a ""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes ""
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| 505 |
8 |
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|a INTRODUCTIONIONIZATION -- Atoms -- Molecules -- Theoretical Methods and Advances -- Neutral Dissociation -- ELECTRON-IMPACT EXCITATION -- ATTACHMENT -- MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS -- GENERAL COMMENTS -- FINDINGS -- REFERENCES -- 6 Ion Processes, Neutral Chemistry, And Thermochemical Data -- INTRODUCTION -- CROSS SECTIONS AND RATE COEFFICIENTS -- Ion Processes -- Momentum Transfer -- Ion-Molecule and Charge Exchange Reactions -- Ion-Ion Neutralization -- Electron-Ion Recombination
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| 505 |
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|a Ion-Neutral and Neutral-Neutral ExcitationNeutral Chemistry -- Status of the Database -- Excited State Chemistry and Penning Ionization -- Summary -- Ion Processes -- Neutral Chemistry -- THERMOCHEMICAL DATA -- FINDINGS -- REFERENCES -- Appendix A: Acronyms and Abbreviations -- Appendix B: Workshop Agenda -- Appendix C: Workshop Participants
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| 546 |
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|a English.
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| 590 |
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|a ProQuest Ebook Central
|b Ebook Central Academic Complete
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| 650 |
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0 |
|a Semiconductors
|x Design and construction
|v Congresses.
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| 650 |
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0 |
|a Plasma engineering
|x Databases
|v Congresses.
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| 650 |
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0 |
|a Plasma engineering
|x Computer simulation
|v Congresses.
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| 650 |
|
6 |
|a Technique des plasmas
|x Bases de données
|v Congrès.
|
| 650 |
|
6 |
|a Technique des plasmas
|x Simulation par ordinateur
|v Congrès.
|
| 650 |
|
7 |
|a Plasma engineering
|x Computer simulation
|2 fast
|
| 650 |
|
7 |
|a Semiconductors
|x Design and construction
|2 fast
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| 655 |
|
7 |
|a Conference papers and proceedings
|2 fast
|
| 776 |
0 |
8 |
|i Print version:
|a Staff, National Research Council.
|t Database Needs for Modeling and Simulation of Plasma Processing.
|d Washington : National Academies Press, ©1900
|z 9780309055918
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| 856 |
4 |
0 |
|u https://ebookcentral.uam.elogim.com/lib/uam-ebooks/detail.action?docID=3376683
|z Texto completo
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| 938 |
|
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|a Askews and Holts Library Services
|b ASKH
|n AH36566972
|
| 938 |
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|a EBL - Ebook Library
|b EBLB
|n EBL3376683
|
| 994 |
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|a 92
|b IZTAP
|
