Database Needs for Modeling and Simulation of Plasma Processing.

Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Staff, National Research Council
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Washington : National Academies Press, 1996.
Colección:The compass series Database needs for modeling and simulation of plasma processing
Temas:
Semiconductors > Design and construction > Congresses.
Plasma engineering > Databases > Congresses.
Plasma engineering > Computer simulation > Congresses.
Technique des plasmas > Bases de données > Congrès.
Technique des plasmas > Simulation par ordinateur > Congrès.
Plasma engineering > Computer simulation
Semiconductors > Design and construction
Conference papers and proceedings
Acceso en línea:Texto completo
Descripción
Descripción Física:1 online resource (74 pages)
Bibliografía:""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes ""
ISBN:9780309573535
030957353X
0309055911
9780309055918

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