Directed self-assembly of block copolymers for nano-manufacturing /
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufactur...
Clasificación: | Libro Electrónico |
---|---|
Otros Autores: | Gronheid, Roel (Editor ), Nealey, Paul (Editor ) |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
Cambridge :
Woodhead Publishing,
[2015]
|
Colección: | Woodhead Publishing series in electronic and optical materials ;
no. 83. |
Temas: | |
Acceso en línea: | Texto completo |
Ejemplares similares
-
Directed self-assembly of block copolymers for nano-manufacturing /
Publicado: (2015) -
Block copolymers : phase morphology, material applications and future challenges /
Publicado: (2014) -
Polymer aging, stabilizers, and amphiphilic block copolymers /
Publicado: (2010) -
Hoch orientierte Triblockcopolymer und Nanokomposit-Elastomere : Herstellung und Charakterisierung.
por: Zielske, Kathrin
Publicado: (2010) -
Amphiphilic block copolymers : self-assembly and applications /
Publicado: (2000)