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Short wavelength laboratory sources : principles and practices /
Our ability to manipulate short wavelength radiation (0.01-100nm, equivalent to 120keV-12eV) has increased significantly over the last three decades. This has lead to major advances in applications in a wide range of disciplines such as: the life and medical sciences, including cancer-related studie...
| Clasificación: | Libro Electrónico |
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| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Cambridge :
Royal Society of Chemistry,
2015.
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| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- ATOMIC AND PLASMA PHYSICS SOFTWARE AND DATABASES FOR THE SIMULATION OF SHORT WAVELENGTH SOURCES ; MODELLING OF PLASMA-BASED SEEDED SOFT X-RAY LASERS ; FIELD COHERENCE OF EUV SOURCES ; REACHABLE EXTREME ULTRAVIOLET WAVELENGTHS ACCORDING TO ELEMENTS/ATOMIC DATA ; ABSORPTION OF SHORT PUMPING PULSES FOR GRAZING INCIDENCE PUMPED X-RAY LASERS ; THEORETICAL ANALYSIS AND EXPERIMENTAL APPLICATIONS OF X-RAY WAVEGUIDES ; TABLE-TOP SOFT X-RAY Ar+8 LASERS EXCITED BY CAPILLARY Z-PINCHES ; NANOMETRE SCALE TAPERED PLANAR WAVEGUIDES FOR FOCUSING X-RAY FEMTOSECOND PULSES.
- ENEA EXTREME ULTRAVIOLET LITHOGRAPHY MICRO-EXPOSURE TOOL: MAIN FEATURES CHARACTERISATION AND MITIGATION OF IONS AND PARTICULATE EMITTED BY SOURCES FOR EXTREME ULTRAVIOLET LITHOGRAPHY ; EUV MULTILAYER OPTICS: DESIGN, DEVELOPMENT AND METROLOGY ; APPLICATIONS OF KrF LASERS FOR GENERATING COHERENT EUV RADIATION ; BROADBAND MULTILAYERS: TAILOR MADE MIRRORS FOR LINEARLY POLARIZED X-RAYS FROM A LASER PLASMA SOURCE ; SHORT WAVELENGTH LABORATORY SOURCES FOR SEMICONDUCTOR INSPECTION AND FABRICATION ; CARBON-NANOTUBES FIELD EMITTER TO BE USED IN ADVANCED X-RAY SOURCE.
- Laser
- plasma euv source for modification of polymer surfaces a sub-picosecond plasma source for time-resolved x-ray measurements ; application of focused x-ray beams in radiation biology; time-resolved x-ray diffraction of cryogenic samples using a laser based plasma source ; near-edge x-ray absorption fine structure measurements using a laboratory-scale xuv source ; nanometer scale imaging using a desk-top laser plasma euv source ; laser-plasma euv and soft x-ray sources for microscopy applications ; nanometer scale imaging with table-top extreme ultraviolet laser.