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150114s2015 enk ob 001 0 eng d |
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|a 2172:1998
|b Royal Society of Chemistry
|n http://www.rsc.org/spr
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|a QC476.S6
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|a 539.7/35
|2 23
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|a UAMI
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|a Short wavelength laboratory sources :
|b principles and practices /
|c editors: Davide Bleiner [and 5 more].
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|a Cambridge :
|b Royal Society of Chemistry,
|c 2015.
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|a 1 online resource
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Includes index.
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|a Online resource; title from web page (Royal Society of Chemistry, viewed January 14, 2015).
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|a Includes bibliographical references at the end of each chapters and index.
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|a ATOMIC AND PLASMA PHYSICS SOFTWARE AND DATABASES FOR THE SIMULATION OF SHORT WAVELENGTH SOURCES ; MODELLING OF PLASMA-BASED SEEDED SOFT X-RAY LASERS ; FIELD COHERENCE OF EUV SOURCES ; REACHABLE EXTREME ULTRAVIOLET WAVELENGTHS ACCORDING TO ELEMENTS/ATOMIC DATA ; ABSORPTION OF SHORT PUMPING PULSES FOR GRAZING INCIDENCE PUMPED X-RAY LASERS ; THEORETICAL ANALYSIS AND EXPERIMENTAL APPLICATIONS OF X-RAY WAVEGUIDES ; TABLE-TOP SOFT X-RAY Ar+8 LASERS EXCITED BY CAPILLARY Z-PINCHES ; NANOMETRE SCALE TAPERED PLANAR WAVEGUIDES FOR FOCUSING X-RAY FEMTOSECOND PULSES.
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|6 880-01
|a ENEA EXTREME ULTRAVIOLET LITHOGRAPHY MICRO-EXPOSURE TOOL: MAIN FEATURES CHARACTERISATION AND MITIGATION OF IONS AND PARTICULATE EMITTED BY SOURCES FOR EXTREME ULTRAVIOLET LITHOGRAPHY ; EUV MULTILAYER OPTICS: DESIGN, DEVELOPMENT AND METROLOGY ; APPLICATIONS OF KrF LASERS FOR GENERATING COHERENT EUV RADIATION ; BROADBAND MULTILAYERS: TAILOR MADE MIRRORS FOR LINEARLY POLARIZED X-RAYS FROM A LASER PLASMA SOURCE ; SHORT WAVELENGTH LABORATORY SOURCES FOR SEMICONDUCTOR INSPECTION AND FABRICATION ; CARBON-NANOTUBES FIELD EMITTER TO BE USED IN ADVANCED X-RAY SOURCE.
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|a Laser -- plasma euv source for modification of polymer surfaces a sub-picosecond plasma source for time-resolved x-ray measurements ; application of focused x-ray beams in radiation biology; time-resolved x-ray diffraction of cryogenic samples using a laser based plasma source ; near-edge x-ray absorption fine structure measurements using a laboratory-scale xuv source ; nanometer scale imaging using a desk-top laser plasma euv source ; laser-plasma euv and soft x-ray sources for microscopy applications ; nanometer scale imaging with table-top extreme ultraviolet laser.
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|a Our ability to manipulate short wavelength radiation (0.01-100nm, equivalent to 120keV-12eV) has increased significantly over the last three decades. This has lead to major advances in applications in a wide range of disciplines such as: the life and medical sciences, including cancer-related studies; environmental science, including studies of pollution and its effects; archaeology and other cultural heritage disciplines; and materials science. Although expansion in application areas is due largely to modern synchrotron sources, many applications will not become widespread, and therefore rout.
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|a ProQuest Ebook Central
|b Ebook Central Academic Complete
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650 |
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|a Radiation sources.
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|a X-rays.
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|a X-Rays
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|a Physics.
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|a Physical Sciences & Mathematics.
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|a Light & Optics.
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|a Sources de rayonnement.
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|a Rayons X.
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|a x-ray (radiation)
|2 aat
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|a SCIENCE
|x Physics
|x Quantum Theory.
|2 bisacsh
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|a Radiation sources
|2 fast
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|a X-rays
|2 fast
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|a Bleiner, Davide,
|e editor.
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758 |
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|i has work:
|a Short wavelength laboratory sources (Text)
|1 https://id.oclc.org/worldcat/entity/E39PCFTcDfddrpRywG33R7FKcX
|4 https://id.oclc.org/worldcat/ontology/hasWork
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|i Print version:
|t Short wavelength laboratory sources : principles and practices.
|d Cambridge, England : Royal Society of Chemistry, ©2015
|h xvi, 451 pages
|z 9781849734561
|
856 |
4 |
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|u https://ebookcentral.uam.elogim.com/lib/uam-ebooks/detail.action?docID=1185602
|z Texto completo
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880 |
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|6 505-01/(S
|a EXTREME ULTRAVIOLET EMISSION FROM MULTI-CHARGED STATE IONS IN POTASSIUM PLASMAS LASER PRODUCED PLASMA X-RAY AND EUV SOURCES FOR LITHOGRAPHY ; PRACTICAL ASPECTS OF XUV GENERATION BY NON-LINEAR FREQUENCY CONVERSION ; ELECTRON TRAJECTORIES IN HIGH HARMONIC GENERATION ; MODIFIED CATHODE TUBE: X-RAY AND XUV RADIATION FOR NANO-INSPECTION ; CHARACTERISTICS OF A SUB-PICOSECOND TITANIUM Kα SOURCE USING RELATIVISTICALLY INTENSE LASERS ; BREMSSTRAHLUNG X-RAY EMISSION IN ELECTRON-BEAM-PUMPED K8F LASERS ; THE BERN ADVANCED GLASS LASER FOR EXPERIMENT (BEAGLE) X-RAY LASER FACILITY.
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