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Total reflection X-ray fluorescence analysis /
Providing an accessible introduction into the use of Total-Reflection X-ray Fluorescence (TXRF) Analysis, both from a theoretical point of view and for practical applications, this new edition of Total-Reflection X-Ray Fluorescence Analysis is completely updated and enlarged to emphasize new methods...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Chichester :
Wiley-Blackwell,
2014.
|
| Edición: | Second edition. |
| Colección: | Chemical analysis
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 100 | 1 | |a Klockenkämper, Reinhold, |d 1937- |e author. |1 https://id.oclc.org/worldcat/entity/E39PBJtRPQG8RXPtQcyWRFFHYP | |
| 245 | 1 | 0 | |a Total reflection X-ray fluorescence analysis / |c Reinhold Klockenkämper. |
| 250 | |a Second edition. | ||
| 264 | 1 | |a Chichester : |b Wiley-Blackwell, |c 2014. | |
| 300 | |a 1 online resource | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 0 | |a Chemical analysis | |
| 588 | 0 | |a CIP data; resource not viewed. | |
| 520 | |a Providing an accessible introduction into the use of Total-Reflection X-ray Fluorescence (TXRF) Analysis, both from a theoretical point of view and for practical applications, this new edition of Total-Reflection X-Ray Fluorescence Analysis is completely updated and enlarged to emphasize new methods and techniques. Written to enable students and scientists to evaluate the suitability of a TXRF method for their specific needs, the text provides an overview to the physical fundamentals and principles of Total-Reflection X-ray Fluorescence (TXRF) Analysis, explains instrumentation and setups, and describes applications in a great variety of disciplines. | ||
| 505 | 0 | |a Total-Reflection X-ray Fluorescence Analysis and Related Methods; Contents; Foreword; Acknowledgments; List of Acronyms; List of Physical Units and Subunits; List of Symbols; Chapter 1: Fundamentals of X-Ray Fluorescence; 1.1 A Short History of XRF; 1.2 The New Variant TXRF; 1.2.1 Retrospect on its Development; 1.2.2 Relationship of XRF and TXRF; 1.3 Nature and Production of X-Rays; 1.3.1 The Nature of X-Rays; 1.3.2 X-Ray Tubes as X-Ray Sources; 1.3.2.1 The Line Spectrum; 1.3.2.2 The Continuous Spectrum; 1.3.3 Polarization of X-Rays; 1.3.4 Synchrotron Radiation as X-Ray Source | |
| 505 | 8 | |a 1.3.4.1 Electrons in Fields of Bending Magnets 1.3.4.2 Radiation Power of a Single Electron; 1.3.4.3 Angular and Spectral Distribution of SR; 1.3.4.4 Comparison with Black-Body Radiation; 1.4 Attenuation of X-Rays; 1.4.1 Photoelectric Absorption; 1.4.2 X-Ray Scatter; 1.4.3 Total Attenuation; 1.5 Deflection of X-Rays; 1.5.1 Reflection and Refraction; 1.5.2 Diffraction and Bragg's Law; 1.5.3 Total External Reflection; 1.5.3.1 Reflectivity; 1.5.3.2 Penetration Depth; 1.5.4 Refraction and Dispersion; References; Chapter 2: Principles of Total Reflection XRF; 2.1 Interference of X-Rays | |
| 505 | 8 | |a 2.1.1 Double-Beam Interference 2.1.2 Multiple-Beam Interference; 2.2 X-Ray Standing Wave Fields; 2.2.1 Standing Waves in Front of a Thick Substrate; 2.2.2 Standing Wave Fields Within a Thin Layer; 2.2.3 Standing Waves Within a Multilayer or Crystal; 2.3 Intensity of Fluorescence Signals; 2.3.1 Infinitely Thick and Flat Substrates; 2.3.2 Granular Residues on a Substrate; 2.3.3 Buried Layers in a Substrate; 2.3.4 Reflecting Layers on Substrates; 2.3.5 Periodic Multilayers and Crystals; 2.4 Formalism for Intensity Calculations; 2.4.1 A Thick and Flat Substrate | |
| 505 | 8 | |a 2.4.2 A Thin Homogeneous Layer on a Substrate 2.4.3 A Stratified Medium of Several Layers; References; Chapter 3: Instrumentation for TXRF and GI-XRF; 3.1 Basic Instrumental Setup; 3.2 High and Low-Power X-Ray Sources; 3.2.1 Fine-Focus X-Ray Tubes; 3.2.2 Rotating Anode Tubes; 3.2.3 Air-Cooled X-Ray Tubes; 3.3 Synchrotron Facilities; 3.3.1 Basic Setup with Bending Magnets; 3.3.2 Undulators, Wigglers, and FELs; 3.3.3 Facilities Worldwide; 3.4 The Beam Adapting Unit; 3.4.1 Low-Pass Filters; 3.4.2 Simple Monochromators; 3.4.3 Double-Crystal Monochromators; 3.5 Sample Positioning | |
| 505 | 8 | |a 3.5.1 Sample Carriers 3.5.2 Fixed Angle Adjustment for TXRF ("Angle Cut"); 3.5.3 Stepwise-Angle Variation for GI-XRF ("Angle Scan"); 3.6 Energy-Dispersive Detection of X-Rays; 3.6.1 The Semiconductor Detector; 3.6.2 The Silicon Drift Detector; 3.6.3 Position Sensitive Detectors; 3.7 Wavelength-Dispersive Detection of X-Rays; 3.7.1 Dispersing Crystals with Soller Collimators; 3.7.2 Gas-Filled Detectors; 3.7.3 Scintillation Detectors; 3.8 Spectra Registration and Evaluation; 3.8.1 The Registration Unit; 3.8.2 Performance Characteristics; 3.8.2.1 Detector Efficiency; 3.8.2.2 Spectral Resolution | |
| 590 | |a ProQuest Ebook Central |b Ebook Central Academic Complete | ||
| 650 | 0 | |a Fluorescence spectroscopy. | |
| 650 | 0 | |a X-ray spectroscopy. | |
| 650 | 0 | |a Reflectance spectroscopy. | |
| 650 | 2 | |a Spectrometry, Fluorescence | |
| 650 | 2 | |a Spectrometry, X-Ray Emission | |
| 650 | 6 | |a Spectroscopie de fluorescence. | |
| 650 | 6 | |a Spectroscopie des rayons X. | |
| 650 | 6 | |a Spectroscopie de réflectance. | |
| 650 | 7 | |a x-ray spectroscopy. |2 aat | |
| 650 | 7 | |a Montana. |2 bisacsh | |
| 650 | 7 | |a Fluorescence spectroscopy |2 fast | |
| 650 | 7 | |a Reflectance spectroscopy |2 fast | |
| 650 | 7 | |a X-ray spectroscopy |2 fast | |
| 758 | |i has work: |a Total reflection X-ray fluorescence analysis (Text) |1 https://id.oclc.org/worldcat/entity/E39PCXjVkcC8thwxW46cHWx79C |4 https://id.oclc.org/worldcat/ontology/hasWork | ||
| 776 | 0 | 8 | |i Print version |z 9781118460276 |
| 856 | 4 | 0 | |u https://ebookcentral.uam.elogim.com/lib/uam-ebooks/detail.action?docID=1891003 |z Texto completo |
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| 938 | |a ProQuest Ebook Central |b EBLB |n EBL1891003 | ||
| 938 | |a Recorded Books, LLC |b RECE |n rbeEB00592618 | ||
| 994 | |a 92 |b IZTAP | ||