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Advanced micro-device engineering IV : selected peer reviewed papers from the 4th international conference on advanced micro-device engineering (AMDE 2012), December 7, 2012, Kiryu City Performing Arts Center, Kiryu, Japan /
Collection of selected, peer reviewed papers from the 4th International Conference on Advanced Micro-Device Engineering (AMDE 2012), December 7, 2012, Kiryu City Performing Arts Center, Kiryu, Japan. The 39 papers are grouped as follows: Chapter 1: Material Science; Chapter 2: Chemical Science and T...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor Corporativo: | |
| Otros Autores: | |
| Formato: | Electrónico Congresos, conferencias eBook |
| Idioma: | Inglés |
| Publicado: |
Durnten-Zurich :
Trans Tech Publications,
[2014]
|
| Colección: | Key engineering materials ;
v. 534. |
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 111 | 2 | |a International Conference on Advanced Micro-Device Engineering |n (4th : |d 2012 : |c Kiryu, Japan) | |
| 245 | 1 | 0 | |a Advanced micro-device engineering IV : |b selected peer reviewed papers from the 4th international conference on advanced micro-device engineering (AMDE 2012), December 7, 2012, Kiryu City Performing Arts Center, Kiryu, Japan / |c edited by Sumio Hosaka. |
| 264 | 1 | |a Durnten-Zurich : |b Trans Tech Publications, |c [2014] | |
| 300 | |a 1 online resource (xii, 232 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Key engineering materials ; |v volume 534 | |
| 588 | 0 | |a Print version record. | |
| 504 | |a Includes bibliographical references. | ||
| 505 | 0 | |a Advanced Micro-Device Engineering IV; Table of Contents; I. Material Science; Estimation of Order Parameter and Spin Moment of Fe3Pt by White X-Ray Diffraction Method; Study of Perpendicular Magnetic Anisotropy in Co/Au Multilayer Probed by Magnetic Compton Profile; TEM Observation and Ionic Conductivity Study of Li2SiO3 Thin-Film on Sapphire Substrate; Electrical Properties of SnS Films Deposited by Thermal Evaporation of Sulfurized Sn Powder; Growth of La1-xBaxCoO3 Single Crystals and their Structural and Magnetic Properties. | |
| 505 | 8 | |a Composition Dependence of the Glass Network Structure in Li+-ion Conducting Glasses of (LiCl)x(LiPO3)1-x Studied by 31P MAS NMRImprovement of Photovoltage in Dye-Sensitized Solar Cells with Azobenzene and Azulene Sensitizing Dyes by Applying Br3-/Br- Redox Mediator; II. Chemical Science and Technology; Nitrification of Nb-Modified Titanias Prepared by the Solvothermal Method and their Photocatalytic Activities under Visible-Light Irradiation; In Situ SAXS Analysis during Uniaxial Drawing of Polyethylene-block-Polystyrene Copolymer Film. | |
| 505 | 8 | |a Tungsten Carbide Nanofiber Prepared by Electrospinning for Methanol Oxidation ReactionSintering of Copper Sub-Micron Particles by Heat and Atmospheric Pressure Non-Equilibrium Plasma Treatments; Functional-Group-Retaining Polymerization of Hydroxyethyl Methacrylate by Atmospheric Pressure Non-Equilibrium Plasma; III. Nano-Science and Technology; Fabrication of 6-nm-Sized Nanodot Arrays with 12 nm-Pitch along Guide Lines Using both Self-Assembling and Electron Beam-Drawing for 5 Tbit/in2 Magnetic Recording. | |
| 505 | 8 | |a Ordering of Self-Assembled Nanodots Improved by Guide Pattern with Low Line Edge Roughness for 5 Tbit/in. 2 Patterned MediaFabrication of CoPt Nanodot Array with a Pitch of 33 nm Using Pattern-Transfer Technique of PS-PDMS Self-Assembly; Fabrication of Carbon Nanodot Arrays with a Pitch of 20 nm for Pattern-Transfer of PDMS Self-Assembled Nanodots; Fabrication of 25-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Drawing, RIE and Ion-Milling; Estimation of HSQ Resist Profile by Using High Contrast Developement Model for High Resolution EB Lithography. | |
| 505 | 8 | |a Monte Carlo Simulation of Electron Trajectory in Solid for Electron Beam LithographyControlled Crystallization Process of Phase Change Memory Device by a Separate Heater Structure; Two Types of On-State Observed in the Operation of a Redox-Based Three-Terminal Device; Influence of Atmosphere on Photo-Assisted Atomic Switch Operations; Growth of Large Quantity ZnO Nanowires and their Optical Properties; IV. Photonics Device and Technology; Orthogonal Dual-Frequency SOA-Fiber Laser; Demonstration of Thermo-Optic Switch Consisting of Mach-Zehnder Polymer Waveguide Drawn Using Focused Proton Beam. | |
| 520 | |a Collection of selected, peer reviewed papers from the 4th International Conference on Advanced Micro-Device Engineering (AMDE 2012), December 7, 2012, Kiryu City Performing Arts Center, Kiryu, Japan. The 39 papers are grouped as follows: Chapter 1: Material Science; Chapter 2: Chemical Science and Technology; Chapter 3: Nano-Science and Technology; Chapter 4: Photonics Device and Technology; Chapter 5: Novel Measurement and System Technology; Chapter 6: Information and Communication Engineering; Chapter 7: Medical Science and Engineering The 39 papers cover material science, chemical science a. | ||
| 590 | |a eBooks on EBSCOhost |b EBSCO eBook Subscription Academic Collection - Worldwide | ||
| 590 | |a ProQuest Ebook Central |b Ebook Central Academic Complete | ||
| 650 | 0 | |a Nanostructures |v Congresses. | |
| 650 | 0 | |a Microtechnology |v Congresses. | |
| 650 | 0 | |a Mechatronics |v Congresses. | |
| 650 | 6 | |a Nanostructures |v Congrès. | |
| 650 | 6 | |a Microtechnologie |v Congrès. | |
| 650 | 6 | |a Mécatronique |v Congrès. | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Engineering (General) |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Reference. |2 bisacsh | |
| 650 | 7 | |a Mechatronics |2 fast | |
| 650 | 7 | |a Microtechnology |2 fast | |
| 650 | 7 | |a Nanostructures |2 fast | |
| 655 | 7 | |a Conference papers and proceedings |2 fast | |
| 700 | 1 | |a Hosaka, Sumio, |e editor. | |
| 758 | |i has work: |a Advanced Micro-Device Engineering IV (Online) (Text) |1 https://id.oclc.org/worldcat/entity/E39PCXfGHRxmxhfdMhF33WR8j3 |4 https://id.oclc.org/worldcat/ontology/hasWork | ||
| 776 | 0 | 8 | |i Print version: |a International Conference on Advanced Micro-Device Engineering (4th : 2012 : Kiryu, Japan). |t Advanced micro-device engineering IV |z 9783037859629 |w (OCoLC)874969594 |
| 830 | 0 | |a Key engineering materials ; |v v. 534. | |
| 856 | 4 | 0 | |u https://ebookcentral.uam.elogim.com/lib/uam-ebooks/detail.action?docID=1910523 |z Texto completo |
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