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Frontiers in electronics : advanced modeling in nanoscale electron devices /

This book consists of four chapters to address at different modeling levels for different nanoscale MOS structures (Single- and Multi-Gate MOSFETs). The collection of these chapters in the book are attempted to provide a comprehensive coverage on the different levels of electrostatics and transport...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Iñiguez, Benjamin (Editor ), Fjeldly, Tor A. (Editor )
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Singapore : World Scientific, [2014]
Colección:Selected topics in electronics and systems ; volume 54.
Temas:
Acceso en línea:Texto completo

MARC

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245 0 0 |a Frontiers in electronics :  |b advanced modeling in nanoscale electron devices /  |c editors, Benjamin Iñiguez, Universitat Rovira, Virgili, Spain, Tor A. Fjeldly, Norwegian University of Science and Technology (NTNU), Norway. 
264 1 |a Singapore :  |b World Scientific,  |c [2014] 
264 4 |c ©2014 
300 |a 1 online resource (204 pages) 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
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490 1 |a Selected topics in electronics and systems ;  |v volume 54 
504 |a Includes bibliographical references and index. 
588 0 |a Online resource; title from PDF title page (ebrary, viewed March 20, 2014). 
505 0 |a PREFACE; CONTENTS; Monte-Carlo Simulation of Ultra-Thin Film Silicon-on-Insulator MOSFETs; 1. Introduction; 2. Ensemble Monte Carlo simulators; 2.1. Quantum correction methods; 2.1.1. The effective potential method; 2.1.2. The density gradient method; 2.1.3. The effective conduction band edge (ECBE) method; 2.1.4. The multivalley effective conduction band edge approach (MV-ECBE); 2.2. Multisubband-Ensemble Monte Carlo method; 2.3. Multisubband-Ensemble Monte Carlo validation; 3. Optimization of ultrathin fully-depleted SOI transistors with ultrathin buried oxide (BOX). 
505 8 |a 4. Orientation effects in ultra-short channel DGSOI devices4.1. DGSOI drain current dependence on crystallographic orientation; Acknowledgments; References; Analytical Models and Electrical Characterisation of Advanced MOSFETs in the Quasi Ballistic Regime; 1. Introduction; 2. The Natori -- Lundstrom models of Quasi Ballistic Transport; 2.1. The Natori model of ballistic transport; 2.2. Injection velocity and subband engineering; 2.3. Lundstrom models of backscattering; 3. Beyond the Natori-Lundstrom model. 
505 8 |a 3.1. Theoretical foundations of the Natori Lundstrom model: the quasi ballistic drift-diffusion theory3.2. Comparison with Monte Carlo simulations: results and discussion; 4. Electrical Characterization of MOSFETs in the Quasi Ballistic Regime; 4.1. Introduction & State of the art; 4.2. Principle of backscattering coefficient extraction in the linear regime; 4.3. Results and discussion; 5. Conclusions; Acknowledgments; References; Physics Based Analytical Modeling of Nanoscale Multigate MOSFETs; 1. Introduction; 2. Modeling of DG MOSFETs Based on Conformal Mapping Techniques. 
505 8 |a 2.1. Conformal Mapping2.2. Inter-Electrode and Subthreshold Electrostatics in DG MOSFETs; 2.2.1. Corner correction; 2.2.2. Effect of subthreshold minority carriers near source and drain; 2.2.3. Verification of subthreshold electrostatics; 2.2.4. Subthreshold drain current; 2.2.5. Subthreshold capacitances; 2.3. Self-Consistent Electrostatics at and above Transition in DG MOSFETs; 2.3.1. Transition voltage; 2.3.2. Above-transition electrostatics; 2.3.3. Drain current; 2.3.4. Above-threshold capacitances; 3. Modeling of Circular Gate MOSFETs. 
505 8 |a 3.1. Subthreshold Electrostatics of GAA MOSFETs Based on 2D Solutions3.2. Subthreshold Modeling of CirG MOSFETs; 3.3. Above-Threshold Modeling of CirG MOSFETs; 4. Unified Analytical Modeling of MugFETs; 4.1. Isomorphic Modeling of CirG and SqG MOSFETs in Subthreshold; 4.1.1. A simple long-channel model; 4.1.2. Short-channel modeling of CirG and SqG devices in subthreshold; 4.1.3. Rectangular gate and trigate MOSFETs; 4.2. Modeling of GAA MOSFETs in Strong Inversion; 4.2.1. Strong inversion electrostatics in DG MOSFETs; 4.2.2. Strong inversion electrostatics in SqG MOSFETs. 
520 |a This book consists of four chapters to address at different modeling levels for different nanoscale MOS structures (Single- and Multi-Gate MOSFETs). The collection of these chapters in the book are attempted to provide a comprehensive coverage on the different levels of electrostatics and transport modeling for these devices, and relationships between them. In particular, the issue of quantum transport approaches, analytical predictive 2D/3D modeling and design-oriented compact modeling. It should be of interests to researchers working on modeling at any level, to provide them with a clear exp. 
546 |a English. 
590 |a eBooks on EBSCOhost  |b EBSCO eBook Subscription Academic Collection - Worldwide 
590 |a ProQuest Ebook Central  |b Ebook Central Academic Complete 
650 0 |a Nanoelectronics. 
650 6 |a Nanoélectronique. 
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650 7 |a TECHNOLOGY & ENGINEERING  |x Reference.  |2 bisacsh 
650 7 |a Nanoelectronics  |2 fast 
700 1 |a Iñiguez, Benjamin,  |e editor. 
700 1 |a Fjeldly, Tor A.,  |e editor. 
758 |i has work:  |a Frontiers in electronics (Text)  |1 https://id.oclc.org/worldcat/entity/E39PCGgykQf4MwyFvxxR9qF8yd  |4 https://id.oclc.org/worldcat/ontology/hasWork 
776 0 8 |i Print version:  |a Iniguez, Benjamin.  |t Frontiers in Electronics : Advanced Modeling of Nanoscale Electron Devices.  |d Singapore : World Scientific Publishing Company, ©2014  |z 9789814583183 
830 0 |a Selected topics in electronics and systems ;  |v volume 54. 
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