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Silicon Technologies : Ion Implantation and Thermal Treatment.

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The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Detalles Bibliográficos
Clasificación:	Libro Electrónico
Autor principal:	Baudrant, Annie
Formato:	Electrónico eBook
Idioma:	Inglés
Publicado:	London : Wiley, 2013.
Colección:	ISTE.
Temas:	Semiconductor doping. Ion implantation. Semiconductors > Heat treatment. Semi-conducteurs > Dopage. Ions > Implantation. Semi-conducteurs > Traitement thermique. Ion implantation Semiconductor doping Semiconductors > Heat treatment
Acceso en línea:	Texto completo

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