Silicon Technologies : Ion Implantation and Thermal Treatment.

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The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Baudrant, Annie
Formato: Electrónico eBook
Idioma:Inglés
Publicado: London : Wiley, 2013.
Colección:ISTE.
Temas:
Semiconductor doping.
Ion implantation.
Semiconductors > Heat treatment.
Semi-conducteurs > Dopage.
Ions > Implantation.
Semi-conducteurs > Traitement thermique.
Ion implantation
Semiconductor doping
Semiconductors > Heat treatment
Acceso en línea:Texto completo
Descripción
Sumario:The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Notas:2.2.3. Mass analysis and beam optics.
Descripción Física:1 online resource (357 pages)
ISBN:9781118601112
1118601114

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