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CMOS nanoelectronics : innovative devices, architectures, and applications /

<STRONG>General Introduction Part 1: Integration of Multigate Devices (FinFET) </STRONG>Introduction to Multigate Devices and Integration Challenges Patterning Requirements for Multigate Devices Gate Stack Design Source/Drain Design: Reduction of Parasitic Resistance <STRONG>Part 2...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Collaert, Nadine
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Boca Raton, Fla. : Pan Standford Pub., 2012.
©2012
Temas:
Acceso en línea:Texto completo
Descripción
Sumario:<STRONG>General Introduction Part 1: Integration of Multigate Devices (FinFET) </STRONG>Introduction to Multigate Devices and Integration Challenges Patterning Requirements for Multigate Devices Gate Stack Design Source/Drain Design: Reduction of Parasitic Resistance <STRONG>Part 2: Circuit-Related Aspects </STRONG>Variability and Its Implications for FinFET SRAM High T Performance of FinFET ESD and Multigate Devices <STRONG>Part 3: Beyond FinFET </STRONG>The Junctionless Nanowire Transistor Transport in Nanostructures Transport Spectr.
Descripción Física:1 online resource (xviii, 412 pages) : color illustrations
Bibliografía:Includes bibliographical references.
ISBN:9789814364034
9814364037