CMOS nanoelectronics : innovative devices, architectures, and applications /
<STRONG>General Introduction Part 1: Integration of Multigate Devices (FinFET) </STRONG>Introduction to Multigate Devices and Integration Challenges Patterning Requirements for Multigate Devices Gate Stack Design Source/Drain Design: Reduction of Parasitic Resistance <STRONG>Part 2...
Clasificación: | Libro Electrónico |
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Otros Autores: | |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
Boca Raton, Fla. :
Pan Standford Pub.,
2012.
©2012 |
Temas: | |
Acceso en línea: | Texto completo |
Sumario: | <STRONG>General Introduction Part 1: Integration of Multigate Devices (FinFET) </STRONG>Introduction to Multigate Devices and Integration Challenges Patterning Requirements for Multigate Devices Gate Stack Design Source/Drain Design: Reduction of Parasitic Resistance <STRONG>Part 2: Circuit-Related Aspects </STRONG>Variability and Its Implications for FinFET SRAM High T Performance of FinFET ESD and Multigate Devices <STRONG>Part 3: Beyond FinFET </STRONG>The Junctionless Nanowire Transistor Transport in Nanostructures Transport Spectr. |
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Descripción Física: | 1 online resource (xviii, 412 pages) : color illustrations |
Bibliografía: | Includes bibliographical references. |
ISBN: | 9789814364034 9814364037 |