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111222s2011 sz ad fob 001 0 eng d |
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|a 897640903
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|a 9783037852859
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|a TK7871.15.S55.H36 2010
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|a 620.193
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|a UAMI
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|a Silicon Science and Advanced Micro-Device Engineering II :
|b selected, peer reviewed papers from the 6th International Symposium on Silicon Science and 2nd International Conference on Advanced Micro-Device Engineering, December 9-10, 2010, Kiryu City Performing Arts Center, Kiryu, Japan /
|c edited by Osamu Hanaizumi, Masafumi Unno and Kenta Miura.
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|a Selected, peer reviewed papers from the 6th International Symposium on Silicon Science and 2nd International Conference on Advanced Micro-Device Engineering, December 9-10, 2010, Kiryu City Performing Arts Center, Kiryu, Japan
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260 |
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|a Switzerland :
|b Trans Tech Publications Ltd,
|c 2011.
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300 |
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|a 1 online resource (320 pages) :
|b illustrations
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336 |
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Key engineering materials,
|x 1662-9795 ;
|v v. 497
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|a Includes bibliographical references and index.
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|a This special collection of 39 peer-reviewed papers imparts the latest findings related to silicon science and advanced micro-device engineering. The papers are grouped into the chapters: Materials Science; Chemical Science and Technology; Nano-Science and Technology; Photonic Devices and Technology; Novel Measurement and System Technology; Information and Communication Engineering; thus offering an up-to-date overview of the subject matter.
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505 |
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|a Adsorption and Sensitizing Properties of Azobenzenes Having Different Numbers of Silyl-Anchor Groups in Dye-Sensitized Solar CellsCarbon-Supported PtRuRh Nanoparticles as a Catalyst for Direct Ethanol Fuel Cells; PAN Based Carbon Nanofibers as an Active ORR Catalyst; Heat-Treatment and Nitrogen-Doping of Activated Carbons for High Voltage Operation of Electric Double Layer Capacitor; Analytical Characteristic of Chromatography Device Using Dielectrophoresis Phenomenon; Chapter 3: Nano-Science and Technology
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505 |
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|a Pico-Newton Controlled Step-in Mode NC-AFM Using a Quadrature Frequency Demodulator and a Slim Probe in Air for CD-AFM Crystal Growth Suppression by N-Doping into Chalcogenide for Application to Next-Generation Phase Change Memory; Influence of Phase-Change Materials and Additional Layer on Performance of Lateral Phase-Change Memories; Random-Access Multilevel Storage in Phase Change Memory by Staircase-Like Pulse Programming; Guide Pattern Functionalization for Regularly Arranged PS-PDMS Self-Assembled Nanodot Pattern by Brush Treatment
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590 |
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|a ProQuest Ebook Central
|b Ebook Central Academic Complete
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650 |
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|a Silicon
|v Congresses.
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650 |
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|a Nanostructures
|v Congresses.
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650 |
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|a Microtechnology
|v Congresses.
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|a Mechatronics
|v Congresses.
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6 |
|a Silicium
|v Congrès.
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650 |
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|a Nanostructures
|v Congrès.
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650 |
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|a Microtechnologie
|v Congrès.
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650 |
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6 |
|a Mécatronique
|v Congrès.
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650 |
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7 |
|a Mechatronics
|2 fast
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|a Microtechnology
|2 fast
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|a Nanostructures
|2 fast
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|a Silicon
|2 fast
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|a Silicon science
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|a Micro-device engineering
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|a ISSS
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|a AMDE
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|a Conference papers and proceedings
|2 fast
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|i has work:
|a Silicon science and advances micro-device engineering II (Text)
|1 https://id.oclc.org/worldcat/entity/E39PCGHkGrhMcfDBYXqwY3WT6q
|4 https://id.oclc.org/worldcat/ontology/hasWork
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776 |
0 |
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|i Print version:
|a Hanaizumi, Osamu.
|t Silicon Science and Advanced Micro-Device Engineering II : Selected, Peer Reviewed Papers from the 6th International Symposium on Silicon Science and 2nd International Conference on Advanced Micro-device Engineering, December 9-10, 2010, Kiryu City Performing Arts Center, Kiryu, Japan.
|d Zurich : Trans Tech Publishers, ©2011
|z 9783037852859
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830 |
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|a Key engineering materials ;
|v v. 497.
|x 1662-9795
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856 |
4 |
0 |
|u https://ebookcentral.uam.elogim.com/lib/uam-ebooks/detail.action?docID=1872733
|z Texto completo
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938 |
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|a Trans Tech Publications, Ltd
|b TRAN
|n 10.4028/www.scientific.net/KEM.497
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938 |
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|a EBL - Ebook Library
|b EBLB
|n EBL1872733
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|a YBP Library Services
|b YANK
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