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Handbook of cleaning for semiconductor manufacturing : fundamentals and applications /
This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physic...
| Clasificación: | Libro Electrónico |
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| Autor principal: | |
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Salem, Mass. ; Scrivener ; Hoboken, N.J. :
John Wiley & Sons, Inc.,
©2011.
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| Colección: | Wiley-Scrivener.
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| Temas: | |
| Acceso en línea: | Texto completo Texto completo |
Tabla de Contenidos:
- Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman
- The Chemistry of Wet Cleaning / D Martin Knotter
- The Chemistry of Wet Etching / D Martin Knotter
- Surface Phenomena: Rinsing and Drying / Karen A Reinhardt, Richard F Reidy, John A Marsella
- Fundamental Design of Chemical Formulations / Robert J Rovito, Michael B Korzenski, Ping Jiang, Karen A Reinhardt
- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T Pate, Donald C Grant
- Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A Reinhardt
- High Dose Implant Stripping / Karen A Reinhardt, Michael B Korzenski
- Aluminum Interconnect Cleaning and Drying / David J Maloney
- Low-k/Cu Cleaning and Drying / Karen A Reinhardt, Richard F Reidy, Jerome Daviot
- Corrosion and Passivation of Copper / Darryl W Peters
- Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J Chabal, Martin M Frank
- Wafer Reclaim / Michael B Korzenski, Ping Jiang
- Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C Le Tiec, Frank Fournel, Ludovic F L Ecarnot, Sebastien L E Kerdil̈s, Daniel Delprat, Christophe Maleville
- New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M Sparks, Alain C Diebold
- Stripping and Cleaning for Advanced Photolithography Applications / John A Marsella, Dana L Durham, Leslie D Molnar.