Handbook of cleaning for semiconductor manufacturing : fundamentals and applications /
This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physic...
Clasificación: | Libro Electrónico |
---|---|
Autor principal: | |
Otros Autores: | |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
Salem, Mass. ; Scrivener ; Hoboken, N.J. :
John Wiley & Sons, Inc.,
©2011.
|
Colección: | Wiley-Scrivener.
|
Temas: | |
Acceso en línea: | Texto completo Texto completo |
MARC
LEADER | 00000cam a2200000 a 4500 | ||
---|---|---|---|
001 | EBOOKCENTRAL_ocn755804433 | ||
003 | OCoLC | ||
005 | 20240329122006.0 | ||
006 | m o d | ||
007 | cr cn||||||||| | ||
008 | 111004s2011 maua ob 001 0 eng d | ||
010 | |a 2011275120 | ||
040 | |a KNOVL |b eng |e pn |c KNOVL |d KNOVL |d VLB |d ZCU |d DEBSZ |d E7B |d OCLCQ |d EBLCP |d YDXCP |d N$T |d OCLCO |d KNOVL |d OCLCQ |d COO |d OCLCQ |d UAB |d OCLCQ |d VT2 |d C6I |d OCLCQ |d OCLCO |d UKAHL |d CZL |d CEF |d CNCEN |d OCLCF |d TAC |d OCLCO |d OCLCQ |d OCLCO |d OCLCL |d OCLCQ |d OCLCL | ||
019 | |a 782860596 |a 1103262876 |a 1103557981 |a 1202546328 |a 1240513691 |a 1272922621 |a 1295594556 |a 1302699119 | ||
020 | |a 9781613441770 |q (electronic bk.) | ||
020 | |a 1613441770 |q (electronic bk.) | ||
020 | |a 9781118071731 |q (electronic bk.) | ||
020 | |a 1118071735 |q (electronic bk.) | ||
020 | |a 0470625953 | ||
020 | |a 1118071743 | ||
020 | |a 9780470625958 | ||
020 | |a 9781118071748 | ||
020 | |a 1118099516 | ||
020 | |a 9781118099513 | ||
020 | |a 1283374595 | ||
020 | |a 9781283374590 | ||
020 | |a 9786613374592 | ||
020 | |a 6613374598 | ||
024 | 8 | |a 9781118099513 | |
029 | 1 | |a AU@ |b 000047980899 | |
029 | 1 | |a AU@ |b 000059226895 | |
029 | 1 | |a DEBSZ |b 352961899 | |
029 | 1 | |a DEBSZ |b 43099611X | |
029 | 1 | |a NZ1 |b 14231886 | |
029 | 1 | |a AU@ |b 000066261472 | |
035 | |a (OCoLC)755804433 |z (OCoLC)782860596 |z (OCoLC)1103262876 |z (OCoLC)1103557981 |z (OCoLC)1202546328 |z (OCoLC)1240513691 |z (OCoLC)1272922621 |z (OCoLC)1295594556 |z (OCoLC)1302699119 | ||
037 | |b Knovel Corporation |n http://www.knovel.com | ||
050 | 4 | |a QC611.6.S9 |b R456 2011eb | |
072 | 7 | |a TEC |x 008090 |2 bisacsh | |
072 | 7 | |a TEC |x 008100 |2 bisacsh | |
082 | 0 | 4 | |a 621.38152 |2 23 |
049 | |a UAMI | ||
100 | 1 | |a Reinhardt, Karen A. | |
245 | 1 | 0 | |a Handbook of cleaning for semiconductor manufacturing : |b fundamentals and applications / |c Karen A. Reinhardt, Richard F. Reidy. |
260 | |a Salem, Mass. ; |a Scrivener ; |a Hoboken, N.J. : |b John Wiley & Sons, Inc., |c ©2011. | ||
300 | |a 1 online resource (xxii, 590 pages) : |b illustrations | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
347 | |a text file | ||
490 | 1 | |a Wiley-Scrivener ; |v v.48 | |
505 | 0 | |a Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman -- The Chemistry of Wet Cleaning / D Martin Knotter -- The Chemistry of Wet Etching / D Martin Knotter -- Surface Phenomena: Rinsing and Drying / Karen A Reinhardt, Richard F Reidy, John A Marsella -- Fundamental Design of Chemical Formulations / Robert J Rovito, Michael B Korzenski, Ping Jiang, Karen A Reinhardt -- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T Pate, Donald C Grant -- Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A Reinhardt -- High Dose Implant Stripping / Karen A Reinhardt, Michael B Korzenski -- Aluminum Interconnect Cleaning and Drying / David J Maloney -- Low-k/Cu Cleaning and Drying / Karen A Reinhardt, Richard F Reidy, Jerome Daviot -- Corrosion and Passivation of Copper / Darryl W Peters -- Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J Chabal, Martin M Frank -- Wafer Reclaim / Michael B Korzenski, Ping Jiang -- Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C Le Tiec, Frank Fournel, Ludovic F L Ecarnot, Sebastien L E Kerdil̈s, Daniel Delprat, Christophe Maleville -- New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M Sparks, Alain C Diebold -- Stripping and Cleaning for Advanced Photolithography Applications / John A Marsella, Dana L Durham, Leslie D Molnar. | |
504 | |a Includes bibliographical references and index. | ||
588 | 0 | |a Print version record. | |
520 | |a This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This. | ||
542 | |f Copyright © John Wiley and Sons |g 2011 | ||
546 | |a English. | ||
590 | |a ProQuest Ebook Central |b Ebook Central Academic Complete | ||
590 | |a O'Reilly |b O'Reilly Online Learning: Academic/Public Library Edition | ||
650 | 0 | |a Semiconductors |x Surfaces |x Cleaning. | |
650 | 0 | |a Surface preparation. | |
650 | 6 | |a Semi-conducteurs |x Surfaces |x Nettoyage. | |
650 | 6 | |a Traitement de surface. | |
650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Semiconductors. |2 bisacsh | |
650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Solid State. |2 bisacsh | |
650 | 7 | |a Engineering |2 fast | |
700 | 1 | |a Reidy, Richard F., |d 1960- |1 https://id.oclc.org/worldcat/entity/E39PCjx9Y44jvprbCbxRMr6mbb | |
758 | |i has work: |a Handbook of cleaning for semiconductor manufacturing (Text) |1 https://id.oclc.org/worldcat/entity/E39PCGKCMqwTcrh3PxRRWXpkQm |4 https://id.oclc.org/worldcat/ontology/hasWork | ||
776 | 0 | 8 | |i Print version: |a Reinhardt, Karen A. |t Handbook of cleaning for semiconductor manufacturing. |d Salem, Mass. : Scrivener ; Hoboken, N.J. : John Wiley & Sons, Inc., ©2011 |z 9780470625958 |w (OCoLC)706716513 |
830 | 0 | |a Wiley-Scrivener. | |
856 | 4 | 0 | |u https://ebookcentral.uam.elogim.com/lib/uam-ebooks/detail.action?docID=700543 |z Texto completo |
856 | 4 | 0 | |u https://learning.oreilly.com/library/view/~/9781118099513/?ar |z Texto completo |
938 | |a Askews and Holts Library Services |b ASKH |n AH21623811 | ||
938 | |a ProQuest Ebook Central |b EBLB |n EBL700543 | ||
938 | |a ebrary |b EBRY |n ebr10510605 | ||
938 | |a EBSCOhost |b EBSC |n 364859 | ||
938 | |a YBP Library Services |b YANK |n 7238515 | ||
938 | |a YBP Library Services |b YANK |n 3648869 | ||
938 | |a YBP Library Services |b YANK |n 12670268 | ||
994 | |a 92 |b IZTAP |