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Dilute Nitride Semiconductors : Physics and Technology.

A review of the current status of research and development in IIINV semiconductor alloys.

Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Henini, Mohamed
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Burlington : Elsevier, 2005.
Temas:
Acceso en línea:Texto completo

MARC

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049 |a UAMI 
100 1 |a Henini, Mohamed. 
245 1 0 |a Dilute Nitride Semiconductors :  |b Physics and Technology. 
260 |a Burlington :  |b Elsevier,  |c 2005. 
300 |a 1 online resource (648 pages) 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
520 |a A review of the current status of research and development in IIINV semiconductor alloys. 
588 0 |a Print version record. 
505 0 |a Cover; Frontmatter; Half Title Page; Copyright; Title Page; Copyright; Preface; Contents; 1. MBE Growth and Characterization of Long Wavelength Dilute Nitride III-V Alloys; 1.1. INTRODUCTION; 1.2. MBE GROWTH OF DILUTE III-V NITRIDES; 1.3. DILUTE NITRIDE CHARACTERIZATION; 1.4. ENERGY BAND AND CARRIER TRANSPORT PROPERTIES; 1.5. ANNEALING AND N-In NEAREST NEIGHBOR EFFECTS; 1.6. SUMMARY; ACKNOWLEDGEMENTS; REFERENCES; 2. Epitaxial Growth of Dilute Nitrides by Metal-Organic Vapour Phase Epitaxy; 2.1. INTRODUCTION; 2.2. EPITAXIAL GROWTH OF GaInAsN-BASED STRUCTURES. 
505 8 |a 2.3. LONG WAVELENGTH GaAs-BASED LASER PERFORMANCES2.4. CONCLUSION; ACKNOWLEDGEMENTS; REFERENCES; 3. The Chemical Beam Epitaxy of Dilute Nitride Alloy Semiconductors; 3.1. INTRODUCTION TO DILUTE NITRIDE SEMICONDUCTORS; 3.2. THE CHEMICAL BEAM EPITAXIAL/METALORGANIC MOLECULAR BEAM EPITAXIAL (CBE/MOMBE) GROWTH PROCESS; 3.3. CBE OF DILUTE NITRIDE SEMICONDUCTORS; 3.4. FUNDAMENTAL STUDIES OF GaNxAs(1-x) BAND STRUCTURE; 3.5. THE COMPOSITIONS AND PROPERTIES OF DILUTE NITRIDES GROWN BY CBE; 3.6. CBE-GROWN DILUTE NITRIDE DEVICES; 3.7. THE POTENTIAL FOR PRODUCTION CBE OF DILUTE NITRIDES; 3.8. CONCLUSIONS. 
505 8 |a ACKNOWLEDGEMENTSREFERENCES; 4. MOMBE Growth and Characterization of III-V-N Compounds and Application to InAs Quantum Dots; ABSTRACT; 4.1. INTRODUCTION; 4.2. MOMBE GROWTH AND CHARACTERIZATION OF GaAsN; 4.3. RELATION OF In AND N INCORPORATIONS IN THE GROWTH OF GaInNAs; 4.4. GROWTH AND CHARACTERIZATION OF GaAsNSe NEW ALLOY; 4.5. APPLICATION OF GaAsN TO InAs QUANTUM DOTS; 4.6. SUMMARY; ACKNOWLEDGEMENTS; REFERENCES; 5. Recent Progress in Dilute Nitride Quantum Dots; 5.1. SELF-ORGANIZED QUANTUM DOTS; 5.2. DILUTE NITRIDE QUANTUM DOTS; 5.3. RECENT EXPERIMENTAL PROGRESS IN GaInNAs QDs. 
505 8 |a 5.4. OTHER KINDS OF DILUTE NITRIDE QDs5.5. SUMMARY AND FUTURE CHALLENGES IN DILUTE NITRIDE QDs; ACKNOWLEDGEMENTS; REFERENCES; 6. Physics of Isoelectronic Dopants in GaAs; 6.1. NITROGEN ISOELECTRONIC IMPURITIES; 6.2. THE FAILURE OF THE VIRTUAL CRYSTAL APPROXIMATION; 6.3. PREVALENT THEORETICAL MODELS ON DILUTE NITRIDES; 6.4. ELECTROREFLECTANCE STUDY OF GaAsN; 6.5. RESONANT RAMAN SCATTERING STUDY OF CONDUCTION BAND STATES; 6.6. COMPATIBILITY WITH OTHER EXPERIMENTAL RESULTS; 6.7. A COMPLEMENTARY ALLOY: GaAsBi; 6.8. SUMMARY; 6.9. CONCLUSION; REFERENCES. 
505 8 |a 7. Measurement of Carrier Localization Degree, Electron Effective Mass, and Exciton Size in InxGa1-xAs1-yNy AlloysABSTRACT; 7.1. INTRODUCTION; 7.2. EXPERIMENTAL; 7.3. SINGLE CARRIER LOCALIZATION IN InxGa1-xAs1-yNy; 7.4. MEASUREMENT OF THE ELECTRON EFFECTIVE MASS AND EXCITON WAVE FUNCTION SIZE; 7.5. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; 8. Probing the "Unusual" Band Structure of Dilute Ga(AsN) Quantum Wells by Magneto-Tunnelling Spectroscopy and Other Techniques; 8.1. INTRODUCTION; 8.2. RESONANT TUNNELLING DIODES BASED ON DILUTE NITRIDES. 
590 |a ProQuest Ebook Central  |b Ebook Central Academic Complete 
650 0 |a Nitrides. 
650 0 |a Semiconductors. 
650 4 |a Semiconductors. 
650 4 |a Materials. 
650 4 |a Nitrides. 
650 6 |a Nitrures. 
650 6 |a Semi-conducteurs. 
650 7 |a semiconductor.  |2 aat 
650 7 |a Nitrides  |2 fast 
650 7 |a Semiconductors  |2 fast 
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776 1 |z 9780080445021 
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994 |a 92  |b IZTAP