Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of re...
Clasificación: | Libro Electrónico |
---|---|
Autor principal: | Samukawa, Seiji (Autor) |
Autor Corporativo: | SpringerLink (Online service) |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
Tokyo :
Springer Japan : Imprint: Springer,
2014.
|
Edición: | 1st ed. 2014. |
Colección: | SpringerBriefs in Applied Sciences and Technology,
|
Temas: | |
Acceso en línea: | Texto Completo |
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