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Nanoimprint Lithography: An Enabling Process for Nanofabrication

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Zhou, Weimin (Autor)
Autor Corporativo: SpringerLink (Online service)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2013.
Edición:1st ed. 2013.
Temas:
Acceso en línea:Texto Completo
Tabla de Contenidos:
  • Principles and statues of nanoimprint lithography
  • Stamp Fabrication
  • stamp surface treatment
  • Nanoimprint lithography resists
  • Nanoimprint lithography process
  • Modeling and Simulation of NIL
  • Application of NIL in Light emitting Diodes
  • Application of NIL in memory devices
  • Application of NIL in solar cell.