Cargando…
Nanoimprint Lithography: An Enabling Process for Nanofabrication
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Autor Corporativo: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Berlin, Heidelberg :
Springer Berlin Heidelberg : Imprint: Springer,
2013.
|
| Edición: | 1st ed. 2013. |
| Temas: | |
| Acceso en línea: | Texto Completo |
MARC
| LEADER | 00000nam a22000005i 4500 | ||
|---|---|---|---|
| 001 | 978-3-642-34428-2 | ||
| 003 | DE-He213 | ||
| 005 | 20220119012242.0 | ||
| 007 | cr nn 008mamaa | ||
| 008 | 130107s2013 gw | s |||| 0|eng d | ||
| 020 | |a 9783642344282 |9 978-3-642-34428-2 | ||
| 024 | 7 | |a 10.1007/978-3-642-34428-2 |2 doi | |
| 050 | 4 | |a TK7875 | |
| 072 | 7 | |a TJF |2 bicssc | |
| 072 | 7 | |a TEC027000 |2 bisacsh | |
| 072 | 7 | |a TJF |2 thema | |
| 082 | 0 | 4 | |a 621.381 |2 23 |
| 100 | 1 | |a Zhou, Weimin. |e author. |4 aut |4 http://id.loc.gov/vocabulary/relators/aut | |
| 245 | 1 | 0 | |a Nanoimprint Lithography: An Enabling Process for Nanofabrication |h [electronic resource] / |c by Weimin Zhou. |
| 250 | |a 1st ed. 2013. | ||
| 264 | 1 | |a Berlin, Heidelberg : |b Springer Berlin Heidelberg : |b Imprint: Springer, |c 2013. | |
| 300 | |a XIII, 249 p. 225 illus., 107 illus. in color. |b online resource. | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 347 | |a text file |b PDF |2 rda | ||
| 505 | 0 | |a Principles and statues of nanoimprint lithography -- Stamp Fabrication -- stamp surface treatment -- Nanoimprint lithography resists -- Nanoimprint lithography process -- Modeling and Simulation of NIL -- Application of NIL in Light emitting Diodes -- Application of NIL in memory devices -- Application of NIL in solar cell. | |
| 520 | |a Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China. | ||
| 650 | 0 | |a Microtechnology. | |
| 650 | 0 | |a Microelectromechanical systems. | |
| 650 | 0 | |a Optical materials. | |
| 650 | 0 | |a Nanotechnology. | |
| 650 | 0 | |a Nanochemistry. | |
| 650 | 1 | 4 | |a Microsystems and MEMS. |
| 650 | 2 | 4 | |a Optical Materials. |
| 650 | 2 | 4 | |a Nanotechnology. |
| 650 | 2 | 4 | |a Nanochemistry. |
| 710 | 2 | |a SpringerLink (Online service) | |
| 773 | 0 | |t Springer Nature eBook | |
| 776 | 0 | 8 | |i Printed edition: |z 9783642344299 |
| 776 | 0 | 8 | |i Printed edition: |z 9783642344275 |
| 776 | 0 | 8 | |i Printed edition: |z 9783662510865 |
| 856 | 4 | 0 | |u https://doi.uam.elogim.com/10.1007/978-3-642-34428-2 |z Texto Completo |
| 912 | |a ZDB-2-ENG | ||
| 912 | |a ZDB-2-SXE | ||
| 950 | |a Engineering (SpringerNature-11647) | ||
| 950 | |a Engineering (R0) (SpringerNature-43712) | ||