CCD Image Sensors in Deep-Ultraviolet Degradation Behavior and Damage Mechanisms /

As the deep-ultraviolet (DUV) laser technology continues to mature, an increasing number of industrial and manufacturing applications are emerging. For example, the new generation of semiconductor inspection systems is being pushed to image at increasingly shorter DUV wavelengths to facilitate inspe...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autores principales: Li, Flora (Autor), Nathan, Arokia (Autor)
Autor Corporativo: SpringerLink (Online service)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2005.
Edición:1st ed. 2005.
Colección:Microtechnology and MEMS,
Temas:
Optical materials.
Lasers.
Engineering.
Electronics.
Optical Materials.
Laser.
Technology and Engineering.
Electronics and Microelectronics, Instrumentation.
Acceso en línea:Texto Completo

MARC

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100 1 |a Li, Flora.  |e author.  |4 aut  |4 http://id.loc.gov/vocabulary/relators/aut 
245 1 0 |a CCD Image Sensors in Deep-Ultraviolet  |h [electronic resource] :  |b Degradation Behavior and Damage Mechanisms /  |c by Flora Li, Arokia Nathan. 
250 |a 1st ed. 2005. 
264 1 |a Berlin, Heidelberg :  |b Springer Berlin Heidelberg :  |b Imprint: Springer,  |c 2005. 
300 |a XII, 232 p. 84 illus.  |b online resource. 
336 |a text  |b txt  |2 rdacontent 
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490 1 |a Microtechnology and MEMS,  |x 2365-0680 
505 0 |a Overview of CCD -- CCD Imaging in the Ultraviolet (UV) Regime -- Silicon -- Silicon Dioxide -- Si-SiO2 Interface -- General Effects of Radiation -- Effects of Radiation on CCDs -- UV-Induced Effects in Si -- UV Laser Induced Effects in SiO2 -- UV Laser Induced Effects at the Si-SiO2 Interface -- CCD Measurements at 157nm -- Design Optimizations for Future Research -- Concluding Remarks. 
520 |a As the deep-ultraviolet (DUV) laser technology continues to mature, an increasing number of industrial and manufacturing applications are emerging. For example, the new generation of semiconductor inspection systems is being pushed to image at increasingly shorter DUV wavelengths to facilitate inspection of deep sub-micron features in integrated circuits. DUV-sensitive charge-coupled device (CCD) cameras are in demand for these applications. Although CCD cameras that are responsive at DUV wavelengths are now available, their long-term stability is still a major concern. This book describes the degradation mechanisms and long-term performance of CCDs in the DUV, along with new results of device performance at these wavelengths. 
650 0 |a Optical materials. 
650 0 |a Lasers. 
650 0 |a Engineering. 
650 0 |a Electronics. 
650 1 4 |a Optical Materials. 
650 2 4 |a Laser. 
650 2 4 |a Technology and Engineering. 
650 2 4 |a Electronics and Microelectronics, Instrumentation. 
700 1 |a Nathan, Arokia.  |e author.  |4 aut  |4 http://id.loc.gov/vocabulary/relators/aut 
710 2 |a SpringerLink (Online service) 
773 0 |t Springer Nature eBook 
776 0 8 |i Printed edition:  |z 9783642061523 
776 0 8 |i Printed edition:  |z 9783540803089 
776 0 8 |i Printed edition:  |z 9783540226802 
830 0 |a Microtechnology and MEMS,  |x 2365-0680 
856 4 0 |u https://doi.uam.elogim.com/10.1007/b139047  |z Texto Completo 
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912 |a ZDB-2-SXC 
950 |a Chemistry and Materials Science (SpringerNature-11644) 
950 |a Chemistry and Material Science (R0) (SpringerNature-43709) 

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