Design for Manufacturability with Advanced Lithography

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufactur...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autores principales: Yu, Bei (Autor), Pan, David Z. (Autor)
Autor Corporativo: SpringerLink (Online service)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Cham : Springer International Publishing : Imprint: Springer, 2016.
Edición:1st ed. 2016.
Temas:
Electronic circuits.
Microprocessors.
Computer architecture.
Electronics.
Electronic Circuits and Systems.
Processor Architectures.
Electronics and Microelectronics, Instrumentation.
Acceso en línea:Texto Completo
Tabla de Contenidos:
  • Introduction
  • Layout Decomposition for Triple Patterning
  • Layout Decomposition for Other Patterning Techniques
  • Standard Cell Compliance and Placement Co-Optimization
  • Design for Manufacturability with E-Beam Lithography
  • Conclusions and Future Works.-.

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