Atomic Layer Deposition for Semiconductors
Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discuss...
Clasificación: | Libro Electrónico |
---|---|
Autor Corporativo: | SpringerLink (Online service) |
Otros Autores: | Hwang, Cheol Seong (Editor ) |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
New York, NY :
Springer US : Imprint: Springer,
2014.
|
Edición: | 1st ed. 2014. |
Temas: | |
Acceso en línea: | Texto Completo |
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