Atomic Layer Deposition for Semiconductors
Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discuss...
Clasificación: | Libro Electrónico |
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Autor Corporativo: | |
Otros Autores: | |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
New York, NY :
Springer US : Imprint: Springer,
2014.
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Edición: | 1st ed. 2014. |
Temas: | |
Acceso en línea: | Texto Completo |
Sumario: | Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discusses ALD for all modern semiconductor devices, the basic chemistry of ALD, and models of ALD processes. The book also details ALD for both mass produced memories and emerging memories. Each chapter of the book provides history, operating principles, and a full explanation of ALD processes for each device. |
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Descripción Física: | X, 263 p. 170 illus., 81 illus. in color. online resource. |
ISBN: | 9781461480549 |